[TIA'M] Official Centella Blending Powder (10g) - [K-BEAUTY] Customizable Cica Soothing Powder & Spot Treatment

✅ Key Features: ✔️ Customizable DIY Skincare: 🧪 Mix a pea-sized amount with your daily moisturizer, toner, or even liquid foundation to boost its soothing and calming properties instantly. ✔️ Intense Cica Care Synergy: 🌿 Formulated with 3 core Centella Asiatica active compounds (Asiaticoside, Asiatic Acid, Madecassic Acid) to deeply calm red, angry, and stressed skin. ✔️ Excess Sebum & Pore Control: 🫧 Contains Silica and Zinc Oxide, which expertly absorb excess facial oil and sebum, leaving a fresh, soft, and matte finish without drying out the skin. ✔️ Direct Spot Treatment: 🎯 Can be applied directly as an intensive overnight spot powder to quickly dry out and soothe targeted areas of concern. ✔️ Gentle & Clean Formula: 🤍 A minimalist ingredient list designed specifically for highly sensitive and acne-prone skin types.

- Key Ingredients: Zea Mays (Corn) Starch, Dextrin, Zinc Oxide, Silica, Asiaticoside, Asiatic Acid, Madecassic Acid, Allantoin, Dipotassium Glycyrrhizate (Concentrated Centella Soothing Base)

📌 Product Details: ▪️ Brand: TIA'M (Official Product) ▪️ Item Name: Centella Blending Powder ▪️ Volume: 10g (0.35 oz) - Manufacture Country: South Korea

🔸 How to Use [2 Ways to Glow]:

1) Custom Blending (Daily Care): Dispense a pea-sized amount of the powder onto your palm. Mix it thoroughly with your daily toner, ampoule, or cream, and apply it evenly over your entire face.

2) Intense Spot Care (Night Routine): After finishing your basic skincare, dab a cotton swab into the powder and apply it directly to specific red spots or areas of concern. Leave it on overnight! (🔥 K-Beauty Pro Tip: Mix a tiny bit of this powder into your liquid foundation to prevent your makeup from melting due to excess oil and sweat during the day!)

🔸 Precautions: Discontinue use if irritation or redness occurs. Do not inhale the powder directly. Keep the cap tightly closed to prevent moisture from entering the bottle.